関西学院大学図書館

Thin films

v. 25. -- Academic Press. <BY00068726>
このページのURL:

所蔵一覧 1件~1件(全1件)

No. 巻号 配架場所 請求記号 資料ID 状態 返却予定日 予約
0001 v. 25 三田4F図書 539.2:P57:25 0002383198 0件
No. 0001
巻号 v. 25
配架場所 三田4F図書
請求記号 539.2:P57:25
資料ID 0002383198
状態
返却予定日
予約 0件

下位書誌一覧 1件~9件(全9件)

1

Organic thin films and surfaces : directions for the nineties

edited by Abraham Ulman. -- Academic Press, c1995.
2

Homojunction and quantum-well infrared detectors

volume editors, Maurice H. Francombe and John L.Vossen. -- Academic Press, c1995.
3

Modeling of film deposition for microelectronic applications

edited by Stephen Rossnagel. -- Academic Press, c1996.
4

Heterojunctions for high-speed and infrared applications

volume editors, Maurice H. Francombe ... [et al.]. -- Academic Press, c1998.
5

Self-assembled monolayers of thiols

edited by Abraham Ulman. -- Academic Press, c1998.
6

PVD for microelectronics : sputter deposition applied to semiconductor manufacturing

Ronald A. Powell, Stephen M. Rossnagel. -- Academic Press, 1998.
7

Ionized physical vapor deposition

edited by Jeffrey A. Hopwood. -- Academic Press, c2000.
8

Frontiers of thin film technology

edited by Maurice H. Francombe ; associate editors, Colin E.C. Wood ... [et al.]. -- Academic Press, c2001.
9

Non-crystalline films for device structures

edited by Maurice H. Francombe. -- Academic Press, c2002.

書誌詳細

標題および責任表示 Thin films
出版事項 San Diego ; Tokyo : Academic Press
形態 v. ; 24 cm
巻号情報
巻次等 v. 25
ISBN 0125330251
その他の標題 その他のタイトル:Thin films : advances in research and development
注記 Serial editors: inorganic thin films, Stephen M. Rossnagel ; organic thin films, Abraham Ulman
注記 Continued from: Physics of thin films : advances in research and development. vols. 1(1963)-19(1994). <BA04340456>
注記 v. 25. Author and subject cummulative index, including table of contents, vols. 1-24
注記 "Thin films : advances in research and development" -- v. 23
NCID BA25443322
本文言語 英語
ISSN 10794050